- HPHT-Derived Monocrystalline Diamond: Produced from synthetic HPHT diamond with high crystallinity and stable abrasive properties.
- Controlled Nano / Submicron Sizes: Available from approximately 50–500 nm for different precision processing requirements.
- High Hardness and Abrasive Efficiency: Provides controlled mechanical removal for hard and brittle materials.
- Crystalline Particle Morphology: Fine angular and irregular diamond particles provide effective cutting action at nanoscale dimensions.
- Controlled Particle Size Distribution: Classification and processing help maintain consistent particle sizing and batch performance.
- Surface Treatment Options: Surface cleaning, dispersion treatment and functionalisation can be provided according to application requirements.
HND – HPHT NanoDiamond
20+ Years Experience
Consistent Batch Quality
Customized Solutions
Product Overview
HND is a monocrystalline nano and submicron diamond powder produced from HPHT synthetic diamond through controlled crushing, fine milling and particle classification. Available from approximately 50–500 nm, it combines high crystallinity and diamond hardness with controlled fine-particle sizing, making it suitable for precision lapping and polishing, surface finishing and functional composite applications.
Features
Specifications
| Material Type | HPHT Nano / Submicron Synthetic Diamond |
|---|---|
| Grade | HND |
| Production Route | HPHT Diamond + Controlled Crushing / Milling / Classification |
| Particle Structure | Monocrystalline Diamond |
| Particle Morphology | Fine Angular / Irregular Crystalline Particles |
| Standard Nominal Sizes | 50 nm / 100 nm / 250 nm / 500 nm |
| Particle Size Distribution | Controlled; customized distributions available |
| Surface Treatment | Cleaned / Dispersed / Functionalized Options Available |
| Selection Focus | Particle size, PSD, morphology, dispersion and surface requirements |
| Typical Applications | Precision Polishing / Surface Finishing / Functional Composites |
| Item | 5nm | 10nm | 30nm | 50nm | 100nm | 250nm | 500nm |
|---|---|---|---|---|---|---|---|
| HND | ✓ | ✓ | ✓ | ✓ | |||
| DND | ✓ | ✓ | ✓ | ✓ | |||
| Note: Particle size and nano-diamond properties can be customised according to customer requirements. | |||||||
Applications
Semiconductor
Used as a fine diamond abrasive in precision processing of hard semiconductor materials.
- SiC wafer lapping and pre-polishing
- Hard substrate surface finishing
- Nano-abrasive polishing formulations
Optical & Optoelectronic
Used for controlled polishing and finishing of hard optical and crystalline materials.
- Sapphire substrate polishing
- Optical crystal finishing
- Precision glass and ceramic processing
Composite Materials
Used as a hard fine-particle reinforcement in functional composite systems.
- Wear-resistant polymer composites
- Functional coatings
- Fine-particle reinforced materials